Defect monitor and method for automated contactless inline wafer inspection
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United States of America Patent
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Sep 28, 1999
Grant Date -
N/A
app pub date -
Dec 10, 1996
filing date -
Dec 10, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
According to the preferred embodiment, a defect monitor is provided that facilitates the location and characterization of defects in a semiconductor device. The defect monitors are designed to facilitate automated scanning electron microscope in voltage contrast mode (SEM-VC) inspection. The defect monitors include a plurality of flags used to quickly locate defects. The SEM-VC magnification can then be increased to further isolate and characterize the defects as necessary. Thus, the preferred embodiment facilitates the use of SEM-VC scanning procedures to automatically detect and locate faults at low magnification, and then characterize the faults a higher magnification, resulting in a much higher throughput.
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