Method of controlling exposure

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United States of America Patent

PATENT NO 5965308
SERIAL NO

08624087

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The exposure quantity with respect to a wafer is correctly measured under each illumination condition even when illumination conditions are changed over. Under each of conditions where the .sigma. value (coherence factor) of an illumination optical system is set to various values including its small, standard, and large values, a correlation data between the output (E) of a reference illuminance meter and the output (I) of an integrator sensor is obtained. With respect to the correlation data for the respective .sigma. values, approximate lines (24A, 24B, 24C, etc) are determined by the method of least squares and then gradients of these lines are stored as correlation coefficients (.alpha.). Under the illumination condition corresponding to each .sigma. value, the output (I) of the integrator sensor is divided by its corresponding correlation coefficient (.alpha.) so as to compute the exposure energy on the image surface.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATION15-3 KONAN 2-CHOME MINATO-KU TOKYO 108-6290

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ozawa, Ken Tokyo, JP 64 753

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