Apparatus and method for scratch wear testing of thin films
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 12, 1999
Grant Date -
N/A
app pub date -
Feb 25, 1998
filing date -
Feb 26, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Methods and apparatus are provided for generating scratch wear resistance information on a given specimen 13 by measuring off-specular light scattering. The technique employs a focused light beam 10 that illuminates the area of the specimen surface which is scratched or otherwise altered by a stylus 5 pressed to this surface with a determined force (load). The stylus is slid along this surface with a determined speed and for a determined distance. In a preferred embodiment, the specimen is mounted on a turntable 4, and the stylus and the optical elements are stationary. The light scattering intensity is measured using a light detector 7 continuously or quasi-continuously and data is evaluated using a computer 9.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully