Method and apparatus for coating resist and developing the coated resist
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United States of America Patent
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Oct 19, 1999
Grant Date -
N/A
app pub date -
Jan 30, 1998
filing date -
Jan 30, 1997
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed is a resist coating-developing method, including (a) a setting step for setting a target value and an allowable range thereof, (b) a resist-coating step, (c) a pre-baking step, (d) a first cooling step, (e) a light-exposure step, (f) a line width measuring step for measuring a line width of a latent image, (g) a post-baking step, (h) a second cooling step, (i) a developing step, (j) a judging step determining whether or not the value of the line width of the latent image measured in step (f) falls within the allowable range of the target value set in step (a), (k) a calculating step determining a difference between the measured value of the latent image line width and the target value, and (l) a correcting step for correcting the process condition in at least one previous step.
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