Method of manufacturing a planar coil using a transparency substrate

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United States of America Patent

PATENT NO 5972193
SERIAL NO

08949001

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Abstract

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The present invention uses a glass to act as a substrate. A stencil layer is patterned on the top surface of the substrate. Successively, a copper layer is deposited over the substrate. Next step is to remove the stencil layer. A negative photoresist layer is formed on the copper layer. A negative photoresist layer is processed using a backside exposure of the resist through the transparent substrate. The backside exposure technique uses the self-aligning, conductive copper layer as a mask. A plurality of trenches are then created in the photoresist layer and a second copper layer is electroplated in the trenches to form the planar coils.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE195 SEC 4 CHUNG HSING RD CHUTUNG HSINCHU 310401

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chou, Min-Chieh Taipei, TW 44 504
Huang, Star Rey-Shing Hsinchu, TW 1 97
Lin, Yuh-Sheng Hsin Tien, TW 13 123
Wu, Ching-Yi Hsinchu, TW 42 840

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