Reticle and method of design to correct pattern for depth of focus problems
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 26, 1999
Issued Date -
N/A
app pub date -
Mar 4, 1998
filing date -
Feb 27, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and apparatus for converting a layout design for the metallization layer integrated circuit pattern to a reticle design having corrections for depth of focus problems. The apparatus includes a design rule checker which is configured to identify locations of the layout design which are expected to produce narrowed regions of the image caused by depth of focus variations at intersections between defined line features of the layout design and the elevated portions of the topographical variations. A depth of focus correction unit is included which is adapted to modify the layout design for the metallization integrated circuit pattern at the locations by increasing the line width of the defined line features from the integrated circuit pattern to correct for these depth of focus problems.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully