Removal of fluorine or chlorine residue by liquid CO.sub.2
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 2, 1999
Issued Date -
N/A
app pub date -
Nov 30, 1998
filing date -
Oct 16, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method for the removal of fluorine or chlorine residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with liquid CO.sub.2.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully