Adaptive inspection method and system
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United States of America Patent
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-
Nov 2, 1999
Grant Date -
N/A
app pub date -
Jan 3, 1997
filing date -
Jan 3, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.
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