Raster-scan photolithographic reduction system
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United States of America Patent
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Nov 9, 1999
Grant Date -
N/A
app pub date -
Sep 30, 1997
filing date -
Sep 30, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A reduction photolithographic scanning system uses a reduction lens with a circular image field that is shaped to an irregular hexagonal configuration affording different effective scanning widths so that the full area of a microcircuit image can be scanned onto a substrate in an integer number of overlapping scans. This minimizes the number of scans required for each image area and maximizes the total image area that can be scanned per time unit.
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