Gradient multilayer film generation process control
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United States of America Patent
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Nov 23, 1999
Grant Date -
N/A
app pub date -
Oct 30, 1997
filing date -
Nov 12, 1996
priority date (Note) -
Expired
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Abstract
Process control for generating graded multilayer films repetitively and consistently using both pulsed laser sputtering and magnetron sputtering deposition techniques. The invention includes an apparatus which allows for set up of an ultrahigh vacuum in a vacuum chamber automatically, and then execution of a computer algorithm or 'recipe' to generate desired films. Software operates and controls the apparatus and executes commands which control digital and analog signals which control instruments.
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