Coating solution applying method and apparatus
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United States of America Patent
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Nov 23, 1999
Grant Date -
N/A
app pub date -
Oct 20, 1997
filing date -
Oct 21, 1996
priority date (Note) -
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status (Latency Note)
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Abstract
A method of applying a coating solution to a surface of a substrate to form a film of desired thickness thereon. The substrate is spun at low speed with a predetermined supplying rotational frequency, and the coating solution is supplied to a region centrally of the substrate. The substrate is decelerated to a predetermined standby rotational frequency lower than the supplying rotational frequency before the coating solution spreads over an entire surface of the substrate. Then, the substrate is accelerated to a target rotational frequency higher than the supplying rotational frequency before the coating solution spreads over the entire surface of the substrate. Subsequently, the substrate is spun at high speed with a predetermined film-forming rotational frequency, thereby coating the surface of the substrate with a film of desired thickness. The supply of the coating solution is continued at least during the deceleration to the standby rotational frequency.
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