Method of processing a substrate utilizing specific chuck

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United States of America Patent

PATENT NO 5989760
SERIAL NO

09040471

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Abstract

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A substrate (10) having a central region (32) and a peripheral region (34) is processed using a chuck (40) that contacts peripheral regions (34) of the substrate but not the central region. A fabrication step is performed while the substrate (10) is on the chuck (40, 60, 70). The chuck can be used in the formation of a lithographic mask or a semiconductor device.

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Patent Owner(s)

Patent OwnerAddress
FREESCALE SEMICONDUCTOR INC6501 WILLIAM CANNON DRIVE WEST AUSTIN TX 78735

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dauksher, William Joseph Mesa, AZ 4 40
Mangat, Pawitter Jit Singh Chandler, AZ 6 76

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