Copper replenishment technique for precision copper plating system
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United States of America Patent
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Dec 7, 1999
Grant Date -
N/A
app pub date -
Mar 30, 1998
filing date -
Mar 30, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A copper replenishment system for replenishing copper which is depleted from a copper plating solution. The replenishment is achieved by the use of a compact filter cartridge, which is inserted into a recirculating loop for the solution. The filter cartridge contains a chemical, which when reacting with the solution replenishes the copper into the solution. The filter cartridge is a compact unit which can be easily handled and reduces the amount of contaminants that could be introduced by the presence of the replenishment chemical.
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