Cleaning compositions for removing etching residue and method of using
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 14, 1999
Issued Date -
N/A
app pub date -
Aug 13, 1998
filing date -
Nov 5, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of removing etching residue from a substrate by contacting a substrate having etching residue present thereon with an etching residue remover derived from a mixture of at least hydroxylamine, an alkanolamine which is miscible with the hydroxylamine, water, and, optionally, a chelating agent at a temperature and for a time sufficient to remove the etching residue from the substrate.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully