Reactive ion etching of alumina/TiC substrates
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United States of America Patent
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Dec 14, 1999
Grant Date -
N/A
app pub date -
Jun 5, 1997
filing date -
Jun 5, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention is a method of patterning the air bearing surface of a ceramic slider preferably including alumina and titanium carbide. The method includes the steps of forming an etch pattern by depositing and developing a photoresist on the ceramic slider, and reactive ion etching the slider air bearing surface using an etchant gas of argon, sulfur hexafluoride, and methyltrifluoride flowing at a rate which provides a smooth patterned surface on the slider air bearing surface.
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