Lens array photolithography
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United States of America Patent
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-
Jan 18, 2000
Grant Date -
N/A
app pub date -
Oct 23, 1997
filing date -
Oct 23, 1997
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus and method for photolithographic exposure of a substrate including an illumination source for providing light for producing an image on the substrate, a mask including a pattern for projection onto the substrate, a lens assembly for projecting the light through a plurality of lens channels onto the substrate and an actuator for moving the lens assembly in a plane parallel to the mask and the substrate for suppressing interference effects.
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