Wafer cleaning system with progressive megasonic wave
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 8, 2000
Grant Date -
N/A
app pub date -
Nov 10, 1998
filing date -
Nov 10, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Improved megasonic cleaning is obtained by use of an apparatus containing a plurality of transducers arranged to transmit a progressive megasonic wave through a liquid containing a planar surface of an object. The progression of the wave is preferably such that particles are carried by the wave toward the toward the edge of the wafer. The processes and apparatus are especially useful for cleaning wafers in the course of manufacturing integrated circuit chips.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully