Method and apparatus for immersion cleaning of semiconductor devices
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United States of America Patent
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Feb 8, 2000
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N/A
app pub date -
Jun 29, 1998
filing date -
Jun 29, 1998
priority date (Note) -
Expired
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Abstract
Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
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