Non-absorbing anti-reflective coated (ARC) reticle using thin dielectric films and method of forming reticle
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United States of America Patent
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Feb 22, 2000
Issued Date -
N/A
app pub date -
Jul 10, 1998
filing date -
Nov 6, 1996
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Abstract
An anti-reflective reticle and a method by which the anti-reflective reticle is formed. Formed upon a first surface of a transparent substrate is a patterned metal layer. Formed upon the first surface of the transparent substrate including the patterned metal layer is a two-layer dielectric stack. The two layer dielectric stack has a first dielectric layer which is closer to the transparent substrate and a second dielectric layer which is formed directly upon the first dielectric layer. The first dielectric layer has an index of refraction greater than the index of refraction of the transparent substrate or the second dielectric layer. The second dielectric layer has a thickness of about one-quarter the wavelength of reflected light desired to be attenuated or eliminated from the surface of the reticle. In addition, the first dielectric layer is formed completely covering a series of metal features within the patterned metal layer and completely covering portions of the transparent substrate exposed adjoining the series of metal features within the patterned metal layer. Preferably, the second dielectric layer is formed co-extensive with the first dielectric layer.
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Patent Owner(s)
| Patent Owner | Address | |
|---|---|---|
| GENERAL SURGICAL INNOVATIONS INC | 3172A PORTER DRIVE PALO ALTO CA 94304 |
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Inventor(s)
| Inventor Name | Address | # of filed Patents | Total Citations |
|---|---|---|---|
| Hsu, Sung-Mu | Hsin Chu, TW | 11 | 144 |
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| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
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