Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
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United States of America Patent
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Feb 29, 2000
Issued Date -
N/A
app pub date -
Dec 31, 1997
filing date -
Mar 11, 1997
priority date (Note) -
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Abstract
Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.
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