Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
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United States of America Patent
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-
Feb 29, 2000
Grant Date -
N/A
app pub date -
Oct 14, 1997
filing date -
Oct 15, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A system and method for reproducing isolated images over an entire substrate, by creating multiple adjacent scanned strips of whole images using a unity magnification scanning photolithographic system.
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Cited Art Landscape
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