Chemical mechanical polishing conditioner
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Mar 7, 2000
Grant Date -
N/A
app pub date -
Sep 29, 1998
filing date -
Sep 29, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A conditioner head uses a fluid purge system to prevent debris from entering openings in the conditioner head and causing deterioration of bearings and other moving components in the conditioner head. The fluid may be a gas, such as nitrogen, or a liquid, such as water or reactive solvents.
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