Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide

United States of America Patent

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Mar 7, 2000
Grant Date
N/A
app pub date
Nov 13, 1997
filing date
Nov 13, 1997

priority date (Note)
Expired

status (Latency Note)

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Abstract

Etching residue, etching mask and silicon nitride and/or silicon dioxide are etched or removed employing a composition containing a fluoride containing compound, water and certain organic solvents.

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Patent Owner(s)

Patent Owner	Address
INTERNATIONAL BUSINESS MACHINES CORPORATION	NEW ORCHARD ROAD ARMONK NY 10504

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Jagannathan, Rangarajan	South Burlington, VT	29	552
Madden, Karen P	Poughquag, NY	12	161
McCullough, Kenneth J	Fishkill, NY	25	329
Okorn-Schmidt, Harald F	Putnam Valley, NY	17	340
Pope, Keith R	Danbury, CT	30	407
Rath, David L	Stormville, NY	81	993

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Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide

Number of patents in Portfolio can not be more than 2000

United States of America Patent

08969595

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PATENT NO	6033996
SERIAL NO	08969595
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08969595

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