Polishing method, abrasive material, and polishing apparatus
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United States of America Patent
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-
Mar 21, 2000
Grant Date -
N/A
app pub date -
Apr 24, 1998
filing date -
Apr 28, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed is a polishing method including the step of: polishing a surface of a member to be polished by rotating and sliding an abrasive wheel holding fixed abrasive grains on the surface of the wheel while supplying free abrasive grains to the surface of the member to be polished; wherein the abrasive wheel is formed by binding the fixed abrasive grains with a soft binder and a pore forming agent. This polishing method is effective to obtain a high flatness of a polished surface and improve surface characteristics of the polished surface, and also to obtain a high continuous-workability by stably keeping a polishing ability for a long period of time.
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