Reference image forming method and pattern inspection apparatus
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United States of America Patent
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Mar 21, 2000
Grant Date -
N/A
app pub date -
Aug 27, 1998
filing date -
Aug 29, 1997
priority date (Note) -
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status (Latency Note)
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Abstract
A reference image forming method is used in a pattern inspection apparatus for scanning a pattern formed on an object to be inspected on the basis of design data with a laser beam having a predetermined wavelength, focusing transmitted light passing through the object on a light-receiving element by using an objective lens, forming a real image from pattern information obtained from the light-receiving element, and comparing the real image with a reference image obtained by imaging the design data, thereby detecting a defect in the object. In this method, reference data is formed by developing the design data as a pattern made of multilevel gradation values on pixels having a resolution higher than an inspection resolution. A reference image is formed by increasing or decreasing the width of each pattern of the reference data as a multilevel gradation pattern with a precision higher than the inspection resolution on the basis of an edge position of a corresponding pattern in the real image. A pattern inspection apparatus is also disclosed.
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