CVD method for forming diamond films

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United States of America Patent

PATENT NO 6042900
SERIAL NO

08614194

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Abstract

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Method is provided for forming CVD nano diamond films for use as cold cathodes in microelectronic devices. Conditions for forming the film outside the plasma region between the cathode and a grid anode are disclosed. Heating of the grid anode makes possible a combination of glow discharge and hot filament deposition.

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Patent Owner(s)

Patent OwnerAddress
REZUNENKO V IGARIBALDI 36 APT 87 117418 MOSCOW
TIMOFEYEV M AFOMICHOVA ST 8-2-85 123481 MOSCOW
RAKHIMOV A TROSTOVSKAYA EMBANKMENT 1-95 MOSCOW 11912
TUGAREV V AGERASIM KURNIKOV 12 K2 APT 6 1221108 MOSCOW
SUETIN N VELECTROSTAL PZ LENIN 20A APT 36 144005 MOSCOW REGION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Rakhimov, Alexander Tursonovich Moscow, RU 1 27
Rezunenko, Vladimir Ivanovich Moscow, RU 2 65
Suetin, Nikolay Vladislavovich Moscow, RU 2 35
Timofeyev, Mikhail Arkadievich Moscow, RU 1 27
Tugarev, Valentin Akimovich Moscow, RU 1 27

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