Method of calibrating WEE exposure tool
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 28, 2000
Grant Date -
N/A
app pub date -
Feb 5, 1999
filing date -
Feb 5, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention provides four sub-patterns located at the periphery of the wafer surface at 90-degree intervals. Each of the four sub-patterns is divided into four alignment scales where each alignment scale is yet again subdivided into a multiplicity of alignment marks. This multiplicity of sub-patterns and alignment scales with each scale having a multiplicity of alignment marks results in very accurate and convenient alignment capability.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully