Bottom antireflective coatings through refractive index modification by anomalous dispersion
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United States of America Patent
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Mar 28, 2000
Grant Date -
N/A
app pub date -
Mar 6, 1997
filing date -
Mar 7, 1996
priority date (Note) -
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Abstract
The invention provides a process for the generation of an antireflective bottom layer with effective reduction of substrate reflectivity and swing curve effects in lithographic applications. It involves the use of a suitably selected monomeric and/or polymeric dye which brings the real part of the refractive index into a range which is optimal for the suppression of reflection-related effects. The refractive index change is effected via anomalous dispersion, i.e., by utilizing changes in the real part of the refractive index caused by the bottom layer's absorption.
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