Method of and apparatus for pattern inspection
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United States of America Patent
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Apr 4, 2000
Grant Date -
N/A
app pub date -
Jan 27, 1998
filing date -
Jan 29, 1997
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method and apparatus for pattern inspection forming an image of a specimen and inspecting a pattern formed on the specimen. This method includes the steps of storing a reference image corresponding to an image of the specimen into a memory, comparing the read out reference image from the memory with the image of the specimen, detecting differing portions between the reference image and image of the specimen as defects, and determining a probability of defects being or becoming a killer defect (i.e., a defect causing failure) of the specimen from other defects based on the detected differing portions.
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