Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Apr 18, 2000
Grant Date -
N/A
app pub date -
Mar 16, 1998
filing date -
Mar 21, 1997
priority date (Note) -
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status (Latency Note)
Importance
Abstract
A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.
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