Photoreceptor fabrication method
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United States of America Patent
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Apr 18, 2000
Grant Date -
N/A
app pub date -
Mar 5, 1998
filing date -
Mar 5, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A photoreceptor fabrication method involving a photoreceptor substrate having a metal surface, comprising etching the metal surface of the photoreceptor substrate with an etching solution and forming a metal oxide layer on the metal surface with the etching solution, wherein the etching of the metal surface and the forming of the metal oxide layer are conducted in the absence of an electric current.
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