Spreading resistance profiling system
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United States of America Patent
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Apr 18, 2000
Grant Date -
N/A
app pub date -
Jul 11, 1997
filing date -
Jul 11, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A system for automatic spreading resistance profiling of wafer specimens. The system comprises a positioning stage for positioning the specimens for contact by probe tips and alternately a probe conditioning fixture or a sample calibration fixture. The system further comprises a programmed computer for controlling the positioning stage to effect automatic specimen profiling, probe tip conditioning, and calibration.
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