Atmosphere concentration monitoring for substrate processing apparatus and life determination for atmosphere processing unit of substrate processing apparatus
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United States of America Patent
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Apr 25, 2000
Grant Date -
N/A
app pub date -
Sep 26, 1997
filing date -
Sep 30, 1996
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Abstract
An atmosphere concentration monitoring system includes multiple measurement ports for collecting atmospheric gas, a port selector for switching the multiple measurement ports, a concentration measurement unit for sampling the atmospheric gas through the selected measurement port and measuring the concentration of a specific substance contained in the sampled atmospheric gas. A different set of measurement conditions are established for each of the measurement ports. The port selector and the concentration measurement unit are controlled according to the different sets of measurement conditions. A life determination device includes a flow rate determination unit for measuring a flow rate of the atmospheric gas passing through the atmosphere processing unit. A throughput of the atmosphere processing unit is determined by integrating, with respect to time, a product of the flow rate and a difference between the upstream and downstream concentrations. The life of the atmosphere processing unit is determined as a function of the throughput.
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