Coating apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 25, 2000
Grant Date -
N/A
app pub date -
Jun 26, 1998
filing date -
Jul 4, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A coating apparatus comprises a spin chuck for supporting a wafer rotatably, a driving mechanism for rotating the spin chuck, a nozzle for supplying a resist solution or a solvent to the wafer supported by the spin chuck, an outer cup arranged to surround the wafer supported by the spin chuck, an inner cup formed like a ring and arranged along an outer peripheral portion of the wafer to be coated over and in close vicinity of the outer peripheral portion upon coating, and an attaching and detaching mechanism for attaching and detaching the inner cup.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully