High temperature performance polymers for stereolithography
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United States of America Patent
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Apr 25, 2000
Grant Date -
N/A
app pub date -
Jan 26, 1998
filing date -
Feb 18, 1997
priority date (Note) -
Expired
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Abstract
The present invention relates to polymer precursors used in sterolithography. Specifically, the invention provides a novel resin having a glass transition temperature (Tg) that is substantially higher than any existing resins. The polymer precursors comprise an admixture of at least one vinyl ether, functionalized compound and at least one epoxy functionalized compound, at least one acrylate functionalized compound, and a photoinitiator, wherein the polymer precursor composition cures by a dual cure mechanism utilizing a free radical pathway as well as a cationic pathway thus yielding improved green strength.
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