Cross flow centrifugal processor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
May 16, 2000
Grant Date -
N/A
app pub date -
Jun 30, 1998
filing date -
Jun 30, 1998
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A centrifugal processor for processing flat media, such as silicon wafers, has a rotor rotatably mounted within a rotor housing. Fan blades on the rotor blow air over the wafers, to move any remaining fluid droplets away from the wafer centers, to allow centrifugal force to fling the fluid droplets off of the wafers. The centrifugal processor uses clean room air, rather than nitrogen, for drying. Operating costs are reduced while manufacturing yields are increased, as spotting at the wafer centers is avoided.
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