Processing apparatus and method using solution
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United States of America Patent
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May 16, 2000
Grant Date -
N/A
app pub date -
Jun 5, 1998
filing date -
Jun 11, 1997
priority date (Note) -
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Abstract
A processing apparatus using solution comprises a rotary table which rotates while holding a substrate thereon, in the processing chamber provided in the casing, a supply mechanism for supplying a processing solution to a surface of the substrate held on the rotary table, and an impurity remover unit, provided outside the casing, wherein the impurity remover unit includes a cleaning unit for cleaning an object gas introduced from the inlet opening by brining it into contact with an impurity remover solution, and the gas-liquid separation mechanism for separating liquid from gas in an exhaust is provided in the exhaust system for exhausting the casing.
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