Plasma focus high energy photon source
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United States of America Patent
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May 16, 2000
Issued Date -
N/A
app pub date -
Mar 15, 1999
filing date -
May 12, 1997
priority date (Note) -
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Abstract
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltage high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration.
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- 15 United States
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- 2 Other
Patent Owner(s)
| Patent Owner | Address | |
|---|---|---|
| ASML NETHERLANDS B V | P O BOX 324 5500 AH VELDHOVEN 5500 AH |
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Inventor(s)
| Inventor Name | Address | # of filed Patents | Total Citations |
|---|---|---|---|
| Birx, Daniel L | Oakley, CA | 27 | 1626 |
| Fomenkov, Igor V | San Diego, CA | 156 | 5670 |
| Partlo, William N | Poway, CA | 183 | 6942 |
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| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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