Etching of silicon nitride

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United States of America Patent

PATENT NO 6066267
SERIAL NO

09342710

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Abstract

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Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.

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Patent Owner(s)

Patent OwnerAddress
INTERNATIONAL BUSINESS MACHINES CORPORATIONARMONK NY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jagannathan, Rangarajan South Burlington, VT 29 552
Madden, Karen P Poughquag, NY 12 161
McCullough, Kenneth J Fishkill, NY 25 329
Okorn-Schmidt, Harald F Putnam Valley, NY 17 340
Pope, Keith R Danbury, CT 30 407
Rath, David L Stormville, NY 81 993

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