Charged-particle-beam exposure device and method capable of high-speed data reading
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United States of America Patent
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Jun 6, 2000
Issued Date -
N/A
app pub date -
Nov 18, 1997
filing date -
Dec 28, 1995
priority date (Note) -
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Abstract
A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts data-position-adjustment data into the control data for each exposure. A first data-storage unit stores the control data, inserted with the data-position-adjustment data, and outputs the control data at a time of the exposure process. Storage positions of the control data in the first data-storage unit are adjusted by the data-position-adjustment data so that the control data can be continuously read from the first data-storage unit for maintaining a continuous exposure process.
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