Broad-band antireflection coating having four sputtered layers
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United States of America Patent
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Jun 13, 2000
Grant Date -
N/A
app pub date -
Dec 31, 1997
filing date -
Dec 31, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A broad-band multilayer antireflection coating comprising four layers designed for deposition in an inline magnetron sputtering machine. The optical thickness of the third layer from the substrate is less than one quarter of a wavelength in the center of the low-reflection band, and the second and fourth layers are made of silicon dioxide.
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