Micromachined scanning torsion mirror and method
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United States of America Patent
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Jun 13, 2000
Grant Date -
N/A
app pub date -
Aug 28, 1998
filing date -
Oct 22, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A silicon nitride scanning torsion mirror supported within a layer of silicon nitride by integral silicon nitride hinges. The layer is supported by a substrate which has a well beneath said mirror. A method of forming a silicon nitride scanning torsion mirror which includes depositing a silicon nitride layer on a support substrate etching the silicon nitride layer to form a mirror supported within the layer by integral torsion hinges and then selectively etching the substrate under the mirror to form a well.
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