Programmable mask for exposure apparatus
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United States of America Patent
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Jul 4, 2000
Grant Date -
N/A
app pub date -
Aug 28, 1998
filing date -
Dec 2, 1997
priority date (Note) -
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Abstract
This invention discloses a programmable mask for exposure apparatus which is formed by an integrated pixels of a micro-devices which shut or open a light by an electrical signal. This invention provides a photolithography method by projecting on a silicon wafer a directly designed circuit pattern which is made on a programmable mask fabricated by an integration of many a micro optical shutter devices as a pixels.
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