Ultraviolet laser apparatus and semiconductor exposure apparatus
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United States of America Patent
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Jul 11, 2000
Grant Date -
N/A
app pub date -
Jun 9, 1998
filing date -
Jun 10, 1997
priority date (Note) -
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Abstract
An ultraviolet laser apparatus which generates laser light at 193 nm to 213 nm with high temporal and spatial coherence and relatively high power is disclosed. The UV laser apparatus provides a light source for an exposure device for optical lithography and an aberration measurement interferometer that measures lens wave front aberration. The laser apparatus disclosed herein comprises two lasers having laser resonators that are coincident along a portion of their respective optical paths. A nonlinear optical crystal is located along the shared optical path portion for sum frequency generation of the light of the respective lasers.
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