Powered shield source for high density plasma
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United States of America Patent
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-
Aug 15, 2000
Grant Date -
N/A
app pub date -
May 14, 1997
filing date -
May 14, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An insulative inter-turn shield positioned at the channel in coil windings to confine the plasma generated by energy radiated by the coil windings in an apparatus for sputtering material onto a workpiece. The insulative shield can prevent the escape of the plasma through the channel between the windings to thereby improve the effectiveness of the sputtering process. In addition, the shield can also block the passage of sputtered material through the channel, preventing the contamination of the vacuum chamber.
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