Pressure relieving pellicle
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 15, 2000
Issued Date -
N/A
app pub date -
Apr 13, 1993
filing date -
May 17, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A pattern mask pellicle comprising a peripheral frame, a transparent film extending across the top peripheral surface of the frame, and a peripheral gasket adhered to the bottom peripheral surface of the frame, the frame/gasket assembly including at least one tacky, continuous, tortuous path connecting an opening in the interior wall of the assembly with an opening in the exterior wall of the assembly. At least one pellicle is mounted on a pattern mask substrate to protect the pattern area during imaging in the production of integrated circuits.
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