MOSFET having buried shield plate for reduced gate/drain capacitance

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United States of America Patent

PATENT NO 6107160
SERIAL NO

09064709

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Abstract

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Gate to drain capacitance in a lateral DMOS and vertical DMOS field effect transistor is minimized by providing a conductive shield plate under the gate and between the gate and the drain of the transistor. In operation, the shield plate is preferably connected to a DC voltage potential and coupled to AC ground for RF power applications. The shield plate is readily fabricated in a conventional polysilicon gate process by adding one additional polysilicon deposition (or other suitable material), one additional mask, and one additional etch step. The shield plate can include a raised portion which provides lateral capacitive isolation between the gate and the drain. Alternatively, a shield contact can be provided above the shield plate and between the gate and drain to provide lateral isolation.

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Patent Owner(s)

Patent OwnerAddress
HANGER SOLUTIONS LLC44 MILTON AVENUE SUITE 254 ALPHARETTA GA 30009

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hebert, Francois San Mateo, CA 187 3281
Ng, Daniel Campbell, CA 70 1507

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