Method for preparing polysilane pattern-bearing substrate
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United States of America Patent
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Aug 29, 2000
Grant Date -
N/A
app pub date -
Dec 10, 1998
filing date -
Dec 11, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A polysilane pattern-bearing substrate is prepared by the steps of (1) forming a polysilane film on a substrate, (2) subjecting the polysilane film to selective light exposure in the presence of a first solvent which does not dissolve polysilane, but dissolves siloxane, for converting the polysilane in selected areas to siloxane for thereby forming a pattern, (3) removing only the siloxane from the substrate of step (2) using a second solvent which does not dissolve polysilane, but dissolves siloxane, and (4) completely removing the second solvent. The polysilane pattern has a high degree of definition.
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