Scanning electron microscope and method for dimension measuring by using the same
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United States of America Patent
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Sep 5, 2000
Issued Date -
N/A
app pub date -
May 10, 1999
filing date -
Oct 12, 1990
priority date (Note) -
Expired
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Abstract
An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.
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