Photoresist coating method and apparatus
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United States of America Patent
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Sep 12, 2000
Grant Date -
N/A
app pub date -
Mar 25, 1998
filing date -
Mar 31, 1997
priority date (Note) -
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Abstract
A resist coating method for forming a resist film on a substrate by supplying a resist solution to substantially a center of a substrate surface while the substrate is rotated, rotating the substrate at a low speed by decelerating the rotation of the substrate after the supply of the resist solution is terminated, and rotating the substrate at a high speed by accelerating the rotation of the substrate after the substrate is rotated at the low speed for a predetermined time-period.
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